PLASMA CHEMISTRY AND PLASMA PROCESSING

期刊基本信息

  • 期刊名称:PLASMA CHEMISTRY AND PLASMA PROCESSING
  • 期刊级别: Science Citation Index Expanded (SCIE) Scopus (CiteScore)
  • 期刊ISSN:0272-4324
  • 期刊EISSN:1572-8986
  • 简称:PLASMA CHEM PLASMA P
  • 影响因子:2.5
  • 实时影响因子:截止2025年5月19日:2.51
  • 五年影响因子:3
  • JCI期刊引文指标:0.59
  • h-index:57
  • 2024-2025自引率:12.00%
  • 期刊官方网站:期刊官方网站
  • 期刊投稿网址:https://mc.manuscriptcentral.com/pcpp
  • 是否OA开放访问:No
  • 出版商:Springer US
  • 出版年份:1981

PLASMA CHEMISTRY AND PLASMA PROCESSING

Science Citation Index Expanded (SCIE)Scopus (CiteScore)

期刊介绍

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

期刊语言要求

Language
Presenting your work in a well-structured manuscript and in well-written English gives it its best chance for editors and reviewers to understand it and evaluate it fairly. Many researchers find that getting some independent support helps them present their results in the best possible light.

投稿要求

CITESCORE

CiteScoreSJRSNIPCiteScore排名
5.100.4620.854
学科分区排名百分位
大类:Physics and Astronomy
小类:Condensed Matter Physics
Q2130 / 443
70%
大类:Physics and Astronomy
小类:General Chemical Engineering
Q297 / 274
64%
大类:Physics and Astronomy
小类:General Chemistry
Q2143 / 404
64%
大类:Physics and Astronomy
小类:Surfaces, Coatings and Films
Q249 / 132
63%

WOS期刊JCR分区

WOS分区等级:2区

按JIF指标学科分区收录子集JIF分区JIF排名JIF百分位
学科:ENGINEERING, CHEMICALSCIEQ396/175
45.4%
学科:PHYSICS, APPLIEDSCIEQ3101/187
46.3%
学科:PHYSICS, FLUIDS & PLASMASSCIEQ213/41
69.5%
按JCI指标学科分区收录子集JCI分区JCI排名JCI百分位
学科:ENGINEERING, CHEMICALSCIEQ268/175
61.43%
学科:PHYSICS, APPLIEDSCIEQ277/187
59.09%
学科:PHYSICS, FLUIDS & PLASMASSCIEQ220/41
52.44%

期刊分区表预警名单

2025年03月发布的2025版:不在预警名单中

2024年02月发布的2024版:不在预警名单中

2023年01月发布的2023版:不在预警名单中

2021年12月发布的2021版:不在预警名单中

2020年12月发布的2020版:不在预警名单中

中科院2025年3月升级版

点击查看中国科学院期刊分区趋势图
大类学科小类学科Top期刊综述期刊
物理与天体物理 4区3区3区
ENGINEERING, CHEMICAL
工程:化工
1区4区3区
PHYSICS, APPLIED
物理:应用
1区3区3区
PHYSICS, FLUIDS & PLASMAS
物理:流体与等离子体
4区4区3区

中科院2023年12月旧的升级版

大类学科小类学科Top期刊综述期刊
物理与天体物理 1区3区4区
ENGINEERING, CHEMICAL
工程:化工
3区2区3区
PHYSICS, APPLIED
物理:应用
3区3区3区
PHYSICS, FLUIDS & PLASMAS
物理:流体与等离子体
2区2区3区

联系我们

QQ:1211130760

微信:iqkan555

微信扫码加好友 微信扫码加好友
QQ扫码加好友 QQ扫码加好友