期刊介绍
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
期刊语言要求
Language
Presenting your work in a well-structured manuscript and in well-written English gives it its best chance for editors and reviewers to understand it and evaluate it fairly. Many researchers find that getting some independent support helps them present their results in the best possible light.
投稿要求
CITESCORE
| CiteScore | SJR | SNIP | CiteScore排名 |
|---|
| 5.10 | 0.462 | 0.854 | | 学科 | 分区 | 排名 | 百分位 | 大类:Physics and Astronomy 小类:Condensed Matter Physics | Q2 | 130 / 443 |
| 大类:Physics and Astronomy 小类:General Chemical Engineering | Q2 | 97 / 274 |
| 大类:Physics and Astronomy 小类:General Chemistry | Q2 | 143 / 404 |
| 大类:Physics and Astronomy 小类:Surfaces, Coatings and Films | Q2 | 49 / 132 |
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WOS期刊JCR分区
WOS分区等级:
2区| 按JIF指标学科分区 | 收录子集 | JIF分区 | JIF排名 | JIF百分位 |
| 学科:ENGINEERING, CHEMICAL | SCIE | Q3 | 96/175 |
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| 学科:PHYSICS, APPLIED | SCIE | Q3 | 101/187 |
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| 学科:PHYSICS, FLUIDS & PLASMAS | SCIE | Q2 | 13/41 |
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| 按JCI指标学科分区 | 收录子集 | JCI分区 | JCI排名 | JCI百分位 |
| 学科:ENGINEERING, CHEMICAL | SCIE | Q2 | 68/175 |
|
| 学科:PHYSICS, APPLIED | SCIE | Q2 | 77/187 |
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| 学科:PHYSICS, FLUIDS & PLASMAS | SCIE | Q2 | 20/41 |
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期刊分区表预警名单
2025年03月发布的2025版:不在预警名单中
2024年02月发布的2024版:不在预警名单中
2023年01月发布的2023版:不在预警名单中
2021年12月发布的2021版:不在预警名单中
2020年12月发布的2020版:不在预警名单中
中科院2025年3月升级版
点击查看中国科学院期刊分区趋势图| 大类学科 | 小类学科 | Top期刊 | 综述期刊 |
|---|
| 物理与天体物理 4区3区3区 | ENGINEERING, CHEMICAL 工程:化工 | 1区4区3区 | PHYSICS, APPLIED 物理:应用 | 1区3区3区 | PHYSICS, FLUIDS & PLASMAS 物理:流体与等离子体 | 4区4区3区 |
| 否 | 否 |
中科院2023年12月旧的升级版
| 大类学科 | 小类学科 | Top期刊 | 综述期刊 |
|---|
| 物理与天体物理 1区3区4区 | ENGINEERING, CHEMICAL 工程:化工 | 3区2区3区 | PHYSICS, APPLIED 物理:应用 | 3区3区3区 | PHYSICS, FLUIDS & PLASMAS 物理:流体与等离子体 | 2区2区3区 |
| 否 | 否 |